Synthesis and properties of free-standing monolayer amorphous carbon

Toh，Chee Tat1,2; Zhang，Hongji3; Lin，Junhao4,5; Mayorov，Alexander S.2; Wang，Yun Peng6,7; Orofeo，Carlo M.1; Ferry，Darim Badur1; Andersen，Henrik2; Kakenov，Nurbek2; Guo，Zenglong5; Abidi，Irfan Haider2; Sims，Hunter6; Suenaga，Kazu4,8; Pantelides，Sokrates T.6,9; Özyilmaz，Barbaros1,2,3

2020-01-09

10.1038/s41586-019-1871-2

NATURE   影响因子和分区

0028-0836

1476-4687

Bulk amorphous materials have been studied extensively and are widely used, yet their atomic arrangement remains an open issue. Although they are generally believed to be Zachariasen continuous random networks, recent experimental evidence favours the competing crystallite model in the case of amorphous silicon. In two-dimensional materials, however, the corresponding questions remain unanswered. Here we report the synthesis, by laser-assisted chemical vapour deposition, of centimetre-scale, free-standing, continuous and stable monolayer amorphous carbon, topologically distinct from disordered graphene. Unlike in bulk materials, the structure of monolayer amorphous carbon can be determined by atomic-resolution imaging. Extensive characterization by Raman and X-ray spectroscopy and transmission electron microscopy reveals the complete absence of long-range periodicity and a threefold-coordinated structure with a wide distribution of bond lengths, bond angles, and five-, six-, seven- and eight-member rings. The ring distribution is not a Zachariasen continuous random network, but resembles the competing (nano)crystallite model. We construct a corresponding model that enables density-functional-theory calculations of the properties of monolayer amorphous carbon, in accordance with observations. Direct measurements confirm that it is insulating, with resistivity values similar to those of boron nitride grown by chemical vapour deposition. Free-standing monolayer amorphous carbon is surprisingly stable and deforms to a high breaking strength, without crack propagation from the point of fracture. The excellent physical properties of this stable, free-standing monolayer amorphous carbon could prove useful for permeation and diffusion barriers in applications such as magnetic recording devices and flexible electronics.

SCI

英语

NI期刊 ; NI论文 ; ESI高被引

其他

JSPS KAKENHI[JP16H06333] ; JSPS KAKENHI[P16823]

Science & Technology - Other Topics

Multidisciplinary Sciences

WOS:000506682500035

NATURE PUBLISHING GROUP

BIOLOGY & BIOCHEMISTRY;CLINICAL MEDICINE;MULTIDISCIPLINARY;PLANT & ANIMAL SCIENCE;ENVIRONMENT/ECOLOGY;SOCIAL SCIENCES, GENERAL;MICROBIOLOGY;ECONOMICS BUSINESS;IMMUNOLOGY;MATERIALS SCIENCE;COMPUTER SCIENCE;SPACE SCIENCE;MOLECULAR BIOLOGY & GENETICS;CHEMISTRY;NEUROSCIENCE & BEHAVIOR;PHYSICS;GEOSCIENCES;ENGINEERING

2-s2.0-85077636951

Scopus

1.Department of Physics,National University of Singapore,Singapore,Singapore
2.Centre for Advanced 2D Materials,National University of Singapore,Singapore,Singapore
3.Department of Materials Science and Engineering,National University of Singapore,Singapore,Singapore
4.National Institute of Advanced Industrial Science and Technology,Tsukuba,Japan
5.Department of Physics,Southern University of Science and Technology,Shenzhen,China
6.Department of Physics and Astronomy,Vanderbilt University,Nashville,United States
7.Hunan Key Laboratory for Super-Microstructure and Ultrafast Process,School of Physics and Electronics,Central South University,Changsha,China
8.Department of Mechanical Engineering,University of Tokyo,Tokyo,Japan
9.Department of Electrical Engineering and Computer Science,Vanderbilt University,Nashville,United States

Toh，Chee Tat,Zhang，Hongji,Lin，Junhao,et al. Synthesis and properties of free-standing monolayer amorphous carbon[J]. NATURE,2020,577(7789):199-203.

Toh，Chee Tat.,Zhang，Hongji.,Lin，Junhao.,Mayorov，Alexander S..,Wang，Yun Peng.,...&Özyilmaz，Barbaros.(2020).Synthesis and properties of free-standing monolayer amorphous carbon.NATURE,577(7789),199-203.

Toh，Chee Tat,et al."Synthesis and properties of free-standing monolayer amorphous carbon".NATURE 577.7789(2020):199-203.