题名 | Blunting and wear of AFM tips during dynamic lithography |
作者 | |
通讯作者 | Zhang,Liangchi |
发表日期 | 2023-06-01
|
DOI | |
发表期刊 | |
ISSN | 0043-1648
|
EISSN | 1873-2577
|
卷号 | 522 |
摘要 | Mechanical scanning probe lithography using AFM tips has been applied to the fabrication of nanostructures on material surfaces. Particularly, the dynamic lithography under the AFM tapping mode is promising in fabricating the surface nanostructures at the width of around 20 nm. However, tip blunting and gradual atom-by-atom wear occurred during the process although the tip tapping motion has largely reduced the tip-surface interaction force and time. This study aims to investigate the blunting rate and mechanism of such AFM tips. It was found that the maximum contact stress was in the range of 0.7 to 1.0 GPa when a silicon AFM tip (initial tip radius under 20 nm) was tapped on a PMMA thin-film surface. And the contact stress was mainly attributed to the tip radius, which was the key factor to limit machinability and machining efficiency of the dynamic lithography. Furthermore, the mechanism of the tip blunting was through its plastic deformation and tip wear. A stress analysis indicated that it was the large stress gradient that contributed to the high density of wrinkles in the tips, and that ninety percent of the blunting of a tip were caused by the plastic deformation, leading to a significant increase of the tip radius. |
关键词 | |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | National Natural Science Foundation of China[52293401];Shenzhen Science and Technology Innovation Program[RCBS20210706092216025];
|
WOS研究方向 | Engineering
; Materials Science
|
WOS类目 | Engineering, Mechanical
; Materials Science, Multidisciplinary
|
WOS记录号 | WOS:000982263300001
|
出版者 | |
EI入藏号 | 20231213752619
|
EI主题词 | Dynamics
; Lithography
; Nanoprobes
; Nanostructures
; Plastic deformation
; Wear of materials
|
EI分类号 | Optical Devices and Systems:741.3
; Nanotechnology:761
; Physical Properties of Gases, Liquids and Solids:931.2
; Solid State Physics:933
; Materials Science:951
|
ESI学科分类 | MATERIALS SCIENCE
|
Scopus记录号 | 2-s2.0-85150289223
|
来源库 | Scopus
|
引用统计 |
被引频次[WOS]:3
|
成果类型 | 期刊论文 |
条目标识符 | //www.snoollab.com/handle/2SGJ60CL/524129 |
专题 | 工学院_创新智造研究院 工学院_力学与航空航天工程系 |
作者单位 | 1.Shenzhen Key Laboratory of Cross-scale Manufacturing Mechanics,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China 2.SUSTech Institute for Manufacturing Innovation,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China 3.Department of Mechanics and Aerospace Engineering,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China |
第一作者单位 | ; 创新智造研究院; 力学与航空航天工程系 |
通讯作者单位 | ; 创新智造研究院; 力学与航空航天工程系 |
第一作者的第一单位 | |
推荐引用方式 GB/T 7714 |
He,Yang,Zhang,Liangchi,Cui,Jipeng,et al. Blunting and wear of AFM tips during dynamic lithography[J]. Wear,2023,522.
|
APA |
He,Yang,Zhang,Liangchi,Cui,Jipeng,&Hu,Jiahao.(2023).Blunting and wear of AFM tips during dynamic lithography.Wear,522.
|
MLA |
He,Yang,et al."Blunting and wear of AFM tips during dynamic lithography".Wear 522(2023).
|
条目包含的文件 | 条目无相关文件。 |
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