题名 | Realization of near-perfect absorption in the whole reststrahlen band of SiC |
作者 | |
通讯作者 | Liu, Qian |
发表日期 | 2018-05-28
|
DOI | |
发表期刊 | |
ISSN | 2040-3364
|
EISSN | 2040-3372
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卷号 | 10期号:20页码:9450-9454 |
摘要 | Materials used for outdoor radiative cooling technologies need not only be transparent in the solar spectral region, but also need to have a broadband perfect absorption in the infrared atmospheric transparency window (infrared-ATW). Silicon carbide (SiC) has been thought to be a potential candidate for such materials. However, due to the near-perfect reflection of electromagnetic waves in the whole reststrahlen band (RB) of SiC, which is within the infrared-ATW, perfect absorption in the whole RB remains a challenge. Here by constructing a cone-pillar double-structure surface on SiC, a near-perfect absorption (>97%) of normally incident electromagnetic waves in the whole RB has been realized experimentally. Simulation results reveal that the dominant reason for the near-perfect absorption is the efficient coupling of incident electromagnetic waves into the bulk evanescent waves in the free-space wavelength range (10.33 m, 10.55 m) and the efficient coupling of incident electromagnetic waves into the surface phonon polaritons in the free-space wavelength range (10.55 m, 12.6 m). Our findings open up an avenue to enhance the absorption performance of SiC in infrared-ATW, and may lead to many new applications. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 其他
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资助项目 | Eu-FP7 Project[247644]
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WOS研究方向 | Chemistry
; Science & Technology - Other Topics
; Materials Science
; Physics
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WOS类目 | Chemistry, Multidisciplinary
; Nanoscience & Nanotechnology
; Materials Science, Multidisciplinary
; Physics, Applied
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WOS记录号 | WOS:000433260300003
|
出版者 | |
EI入藏号 | 20182205244151
|
EI主题词 | Circular waveguides
; Electromagnetic waves
; Phonons
; Silicon carbide
|
EI分类号 | Heat Transfer:641.2
; Electromagnetic Waves:711
; Waveguides:714.3
; Inorganic Compounds:804.2
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:13
|
成果类型 | 期刊论文 |
条目标识符 | //www.snoollab.com/handle/2SGJ60CL/27696 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.Natl Ctr Nanosci & Technol, CAS Key Lab Nanosyst & Hierarch Fabricat, Beijing 100190, Peoples R China 2.Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA 3.Chinese Acad Sci, Inst Microelect, CKey Lab Microelect Devices & Integrated Technol, Beijing 100029, Peoples R China 4.Southern Univ Sci & Technol, Dept Mat Sci & Engn, 1088 Xueyuan Blvd, Shenzhen 518055, Guangdong, Peoples R China 5.Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Suzhou 212213, Peoples R China |
推荐引用方式 GB/T 7714 |
Chen, Dongxue,Dong, Jianjie,Yang, Jianji,et al. Realization of near-perfect absorption in the whole reststrahlen band of SiC[J]. Nanoscale,2018,10(20):9450-9454.
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APA |
Chen, Dongxue.,Dong, Jianjie.,Yang, Jianji.,Hua, Yilei.,Li, Guixin.,...&Liu, Qian.(2018).Realization of near-perfect absorption in the whole reststrahlen band of SiC.Nanoscale,10(20),9450-9454.
|
MLA |
Chen, Dongxue,et al."Realization of near-perfect absorption in the whole reststrahlen band of SiC".Nanoscale 10.20(2018):9450-9454.
|
条目包含的文件 | 条目无相关文件。 |
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